Reduction Reticles

A reticle is a type of photomask where the original design is scaled up, typically by a factor of 1 to 10X.  The reticle image is then transferred to the wafer using a ‘step and repeat’ system. The image on the reticle is reduced through the system’s optics and exposed onto the wafer substrate multiple times to build up the full array of images covering the target wafer or glass plate.

Specifications can be fully customized to meet your specific needs:

Reticle Photomasks Plate Dimensions and Substrate Materials

Product Plate Dimensions Substrate Material
6″ X 6″ X 0.250″ Quartz
5X 5″ X 5″ X 0.090″ Quartz
6″ X 6″ X 0.250″ Quartz